k-Space Senior Development Engineer, Greg DeMaggio, will chair a session on “Thin Films Synthesis and Diagnostics” at the 2023 AVS Michigan Chapter spring symposium.

Atomic control for epitaxy thin film metrology animation
Atomic control for epitaxy thin film metrology animation

The AVS symposium will be held June 7 at University of Michigan’s North Campus Research Complex.

The AVS symposium brings together experts from academia, research, and industry to facilitate discussions on the future of the US semiconductor ecosystem.

Panelists include:

  • Rachel Goldman of the University of Michigan. “Tailoring semiconductor polytype selection during molecular-beam epitaxy.”
  • Bob Sacks, of MACOM. “Molecular Beam Epitaxy at MACOM.”
  • Mathias Muehle, of Fraunhofer CMW. “Using image based artificial intelligence growth prediction to improve SCD wafer dimensions and growth yield.”

For more information, visit AVS.

Go here to learn more about Molecular Beam Epitaxy.

Thin Film and Industrial Metrology Systems

Have a measurement challenge in mind?

One of the pillars of our success is standing by as consultants. We’re always here to talk about your project needs.

Contact Us