k-Space CEO Darryl Barlett sat down with Compound Semiconductor editor, Richard Stevenson, to discuss how metrology will fuel a rise of AI-led discoveries across the industry. Highlights from their discussion are included below.
Click here for the full interview.
The discussion centered on thin-film metrology’s role in helping to advance the implementation of AI and machine learning within the industry. As an example, RHEED images, spectral analysis, temperature measurements, film thickness monitoring, and other metrology data are delivered in real-time to AI tools. This can then enable new material discoveries.
Barlett and Compound Semiconductor also discussed the industry push for more and better RHEED data, and how this has led to growing demand for kSA 400, and for kSA RHEEDSim.
Other key discussion points included:
- Why RHEED is again at the forefront of thin-film metrology.
- How differences between MBE and MOCVD led k-Space to develop a single optics head that combines growth rate monitoring, wafer curvature, film stress, and temperature measurements.
