k-Space utilizes its world class metrology tools to offer in-house wafer and sample characterization. Our thin-film characterization tools can perform full wafer/sample maps of curvature, bow height, tilt, and absolute reflectivity at 660nm. We can also perform spectral reflectivity, absolute transmission, optical absorption edge, and temperature-dependent optical absorption edge measurements.

Absolute Reflectivity and Transmission Measurement

  • Both absolute reflectivity and transmission measurements made at 405nm, 532nm, and 660nm

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Spectral Reflectivity Measurement

  • Wavelength range: 380nm to 1700nm
  • Regulated Quartz Halogen and Xe Light Sources
  • Absolute reflectivity measurements can be made using in-house calibration standards over the 350nm-1100nm range with better than 0.5% absolute reflectivity accuracy

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Thin Film and Industrial Metrology Systems

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